VII Curso Introducción a la Investigación13 15 Ab il 201113-15 Abril 2011

Nanolitografía con PolímerosNanolitografía con Polímeros

T A EzquerraT.A. Ezquerra

SOFMATPOLDept. Física Macromolecularp

Instituto de Estructura de la Materia, CSIC, Serrano 119, 121, 28006 Madrid, Spain

Nanotechnology : The origin

“There's Plenty of Room at the Bottom”Richard P. Feynman (Physics Nobel Prize 1965)y ( y )

Conference on December 29th 1959 at the annual meeting of theAmerican Physical Society

http://www.zyvex.com/nanotech/feynman.html

• “……I want to talk about is the problem of manipulating and controlling things on a small scale”

• “…..Why cannot we write the entire 24 volumes of the Encyclopedia Brittanicaon the head of a pin?”

• “…Why can't we drill holes, cut things, solder things, stamp things out, mold different shapes all at an infinitesimal level?”

Be realistic and demand the impossible ¡ Paris Graffiti, May 1968

Outline

“There's Plenty of Room at the Bottom”Richard P. Feynman (Physics Nobel Prize 1965)y ( y )

• “…..Why cannot we write the entire 24 volumes of the Encyclopedia Brittanicaon the head of a pin?”

How to write?

• electrons

• lightHow to read?

light

• small tools

Reading and Writing with Light : DVD technology

• Write with a Laser beam (Burning)

• Read with a Laser beam• Read with a Laser beam

microns

Writing with electrons: e-beam lithography

Electron beamClean Room

P l filPolymer film

Silicon

Writing with electrons: Reactive Ion Etching (RIE)

Gold evaporation

Lift off Reactive Ion Etching (RIE)

p

PolymerPolymer

Silicon

Polymer solution

RIE

Nano-Molding

Nanometers

L.J. Guo, Adv. Mater. 2007, 19, 495–513

Nano-Imprint Lithography (NIL)

Polymer

Silicon

NIL Applications : Nanosensors ( SERS Biochips )NIL Applications : Nanosensors ( SERS, Biochips…..)NanodevicesNanotemplates (Soft-Nanolitography, nanomolds…..)

Working conditions: LARGE SCALE FACILITIES

Clean Room

Instituto de Microelectrónica de Barcelona

Instituto de Sistemas Optoelectrónicos y Microtecnología (ISOM)Universidad Politécnica de Madrid

Nano-Molding @ SOFMATPOL_Group_IEM-CSIC

N t M tifNanometer Motifs

Nano-IMPRINT (NIL) @ SOFMATPOL_Group_IEM-CSIC

Poly(trimethylene terephthalate)

Atomic Force Microscopy (AFM)@ SOFMAT_Group_IEM-CSIC

Nanoscope IIIA Multimode ( Vecco ) operating in the tapping mode.

qz

Grazing Incidence X-ray Scattering (GISAXS)

SCATTERING “IN PLANE”SCATTERING “IN PLANE”

• qy= 0St t l l ti di l t th fil f

SCATTERING “IN PLANE”SCATTERING “IN PLANE”

• qy= 0St t l l ti di l t th fil f

• qy= 0St t l l ti di l t th fil f

qy

SCATTERING “OUT OF PLANE”SCATTERING “OUT OF PLANE”

)sin(sin2fizq

qz: wavevector component perpendicular to the film surface.

• Structural correlation perpendicular to the film surface:

SCATTERING “OUT OF PLANE”SCATTERING “OUT OF PLANE”

)sin(sin2fizq

qz: wavevector component perpendicular to the film surface.

• Structural correlation perpendicular to the film surface:• Structural correlation perpendicular to the film surface:

X ray beam)cos(sin2

fyq

SCATTERING OUT OF PLANESCATTERING OUT OF PLANE

qy: wavevector component parallel to the film surface.

• qz= constant• Structural correlation parallel to the film surface:

)cos(sin2fyq

SCATTERING OUT OF PLANESCATTERING OUT OF PLANE

qy: wavevector component parallel to the film surface.

• qz= constant• Structural correlation parallel to the film surface:• qz= constant• Structural correlation parallel to the film surface:

X-ray beamX-ray beam

BW4 Beamline.

f HASYLAB, DESY (Hamburg, Germany)

i

i

Si_Mold

Results : Grazing Incidence X-ray ScatteringISOM_3

e-beam Lithography in Si

Plantilla A(nm) B(nm) C = A+B 1 93 55 1482 136 59 1953 91 21 1124 149 44 1936 94 19 1136 94 19 113

8b 58 40 98

25 nm

2.5x2.5 ?m2ISOM_3a_180_an265_1

10

EXP = 0.4

: disorder factor 10-7→1-dimensional crystallinelattice

25 nm

35 n

m

I(a.u

.)

0.1

1=0.0=0.4

EXP

omega

-0.4 -0.2 0.0 0.2 0.40.01

4x4 ?m2

MODMOD

4x4 ?m2

X-ray Scattering @ SOFMAT_Group_IEM-CSIC

rayos Xrayos Xrayos XCátodo

à d

rayos Xrayos Xrayos X

ànodoe-e-e-

Producción de Rayos X : SincrotronesX-ray Scattering @ Large Facilities . Synchrotrons

Estaciones de trabajo (beam-lines)

Linac . Acelerador lineal

Linac

Anillo de inyección

Linac

G d

Anillo

Generador de e- 270 m

Anillo

European Synchrotron Radiation Facility (ESRF), Grenoble, France

LARGE SCALE FACILITIES : Synchrotrons

ALBA

http://www.cells.es

Aurora Nogales

A Flash of SOFMATPOL in one Minute

Daniel MartínezgX-ray, Neutrons, PhysicsDielectrics, Biophysics

Ignacio Martín-Fabiani

Dielectrics, PhysicsBlends, Copolymers

Come and make a PhD with us ¡gX-ray, AFM, Physics Dielectrics, Nanofilms

Amelia Linares

Come and make a PhD with us ¡

http://www.iem.cfmac.csic.es/softmatpol/Amelia LinaresConductivity, ChemistryNanocomposites

Alejandro SanzMariCruz GarcíaX-ray, Microfocus Physics,

p p

Alejandro SanzNeutrons, Dielectrics, CalorimetryCrystallization, Dynamics, Liquids

Daniel Rueda

y, f y ,MicroMechanics, Nanomaterials

José Carlos CanaldaX-rays Calorimetry ChemistryDaniel Rueda

X-ray crystallography ,Chemistry Crystallization, Nanomaterials

X-rays, Calorimetry, ChemistryHandyman, SciFiction, Webmaster

Maria Esperanza CagiaoX-rays Calorimetry ChemistryX-rays, Calorimetry, Chemistry Microhardness

Tiberio EzquerraToday’s Speaker

Mi h l S iJaime HernándezAFM X Ch i tMichela Soccio

Chemistry,DielectricsX-rays, Calorimetry

AFM, X-rays, ChemistryNanomaterials

Thanks to MICINN : AT2009-07789 ;MAT2008-03232